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Formation of Si nanostructure using size reduction technique

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.

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Bibliographic Details
Main Authors: Th., Shikra Dhahi, Uda, Hashim, Prof. Dr., N. M., Ahmed
Other Authors: sthikra@yahoo.com
Format: Working Paper
Language:English
Published: Universiti Malaysia Perlis (UniMAP) 2012
Subjects:
Si–SiO2 substrate
Photolithography
Scanning electron microscope (SEM)
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/21498
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spelling my.unimap-214982012-10-21T08:47:24Z Formation of Si nanostructure using size reduction technique Th., Shikra Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed sthikra@yahoo.com Si–SiO2 substrate Photolithography Scanning electron microscope (SEM) International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia. A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used for the electrode. Two chrome masks are proposed to complete this work, the first mask for the nanogap pattern and a second mask for the electrode. With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several different nanometer dimensions. In this work, the proposed method is experimentally demonstrated by preparing the nanogaps on a Si–SiO2 substrate. The optical characterization that is applied to check the nanogap structure is by using the scanning electron microscope (SEM). 2012-10-21T08:47:23Z 2012-10-21T08:47:23Z 2010-10-16 Working Paper 978-967-5760-03-7 http://hdl.handle.net/123456789/21498 en Proceedings of the International Postgraduate Conference on Engineering (IPCE 2010) Universiti Malaysia Perlis (UniMAP) Centre for Graduate Studies
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Si–SiO2 substrate
Photolithography
Scanning electron microscope (SEM)
spellingShingle Si–SiO2 substrate
Photolithography
Scanning electron microscope (SEM)
Th., Shikra Dhahi
Uda, Hashim, Prof. Dr.
N. M., Ahmed
Formation of Si nanostructure using size reduction technique
description International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.
author2 sthikra@yahoo.com
author_facet sthikra@yahoo.com
Th., Shikra Dhahi
Uda, Hashim, Prof. Dr.
N. M., Ahmed
format Working Paper
author Th., Shikra Dhahi
Uda, Hashim, Prof. Dr.
N. M., Ahmed
author_sort Th., Shikra Dhahi
title Formation of Si nanostructure using size reduction technique
title_short Formation of Si nanostructure using size reduction technique
title_full Formation of Si nanostructure using size reduction technique
title_fullStr Formation of Si nanostructure using size reduction technique
title_full_unstemmed Formation of Si nanostructure using size reduction technique
title_sort formation of si nanostructure using size reduction technique
publisher Universiti Malaysia Perlis (UniMAP)
publishDate 2012
url http://dspace.unimap.edu.my/xmlui/handle/123456789/21498
_version_ 1643793428642791424
score 13.211869

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