The study on the effects of varying Dopant concentration and Diffusion Time in the design of Silicon Avalanche Diode with minimum Vbr of 120v+20% by simulation
Technology CAD (TCAD) refers to the use of computer simulation to model semiconductor processing and device operation. TCAD has two major functions which are process simulation and device simulation. In this project, Synopsys Taurus Workbench including TSUPREM-4 and Medici is used as a virtual IC fa...
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| フォーマット: | Learning Object |
| 言語: | English |
| 出版事項: |
Universiti Malaysia Perlis
2008
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| オンライン･アクセス: | http://dspace.unimap.edu.my/xmlui/handle/123456789/1952 |
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