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Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing

The escalating demand for glass that exhibits various surface functions has encouraged efforts to develop more efficient and economical micro-/nano-patterning of glass substrates. We propose rapid hot embossing of glass micro-/nanostructures using an infrared transmissive mold assisted by CO2 laser...

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Main Authors: Lee, Helen May Shian, Ismayuzri, Ishak, Mohd Zairulnizam, Mohd Zawawi
Format: Article
Language:English
Published: Japan Laser Processing Society 2023
Subjects:
TS Manufactures
Online Access:http://umpir.ump.edu.my/id/eprint/36973/1/SCIE%20Journal_Rapid%20Fabrication%20of%20Glass%20Micro%20and%20Nanostructures%20via%20Laser-assisted.pdf
http://umpir.ump.edu.my/id/eprint/36973/
http://www.jlps.gr.jp/jlmn/
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spelling my.ump.umpir.369732023-02-10T08:43:27Z http://umpir.ump.edu.my/id/eprint/36973/ Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing Lee, Helen May Shian Ismayuzri, Ishak Mohd Zairulnizam, Mohd Zawawi TS Manufactures The escalating demand for glass that exhibits various surface functions has encouraged efforts to develop more efficient and economical micro-/nano-patterning of glass substrates. We propose rapid hot embossing of glass micro-/nanostructures using an infrared transmissive mold assisted by CO2 laser irradiation. This resistless, etch-free technique utilizes the synergy of the silicon mold’s high transmittance and strong optical absorption of the glass at a 10.6-μm wavelength. Furthermore, this non-isothermal process requires preheating of the glass temperature below the glass transformation point (Tg) of the glass, eliminating the soaking time, and using a short contact pressing time and a lower pressing load to produce high-resolution space patterns. The method is capable of instantaneous high-resolution replication of various grating patterns from the nano- to microscale with a single laser scan. By controlling the scanning speed and ensuring sufficient pressure and heating depth on the glass surface, 250-nm to 50-μm line- widths and space patterns were embossed in a few seconds with excellent replication fidelity. The laser-assisted hot embossing methods developed in this study facil-itated high-throughput, energy-efficient, reproducible, and highly accurate micro-/nano-patterning of glass surfaces. Japan Laser Processing Society 2023 Article PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/36973/1/SCIE%20Journal_Rapid%20Fabrication%20of%20Glass%20Micro%20and%20Nanostructures%20via%20Laser-assisted.pdf Lee, Helen May Shian and Ismayuzri, Ishak and Mohd Zairulnizam, Mohd Zawawi (2023) Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing. JLMN-Journal of Laser Micro/Nanoengineering, 18 (1). pp. 1-7. ISSN 1880-0688. (Published) http://www.jlps.gr.jp/jlmn/
institution Universiti Malaysia Pahang Al-Sultan Abdullah
building UMPSA Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Pahang Al-Sultan Abdullah
content_source UMPSA Institutional Repository
url_provider http://umpir.ump.edu.my/
language English
topic TS Manufactures
spellingShingle TS Manufactures
Lee, Helen May Shian
Ismayuzri, Ishak
Mohd Zairulnizam, Mohd Zawawi
Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
description The escalating demand for glass that exhibits various surface functions has encouraged efforts to develop more efficient and economical micro-/nano-patterning of glass substrates. We propose rapid hot embossing of glass micro-/nanostructures using an infrared transmissive mold assisted by CO2 laser irradiation. This resistless, etch-free technique utilizes the synergy of the silicon mold’s high transmittance and strong optical absorption of the glass at a 10.6-μm wavelength. Furthermore, this non-isothermal process requires preheating of the glass temperature below the glass transformation point (Tg) of the glass, eliminating the soaking time, and using a short contact pressing time and a lower pressing load to produce high-resolution space patterns. The method is capable of instantaneous high-resolution replication of various grating patterns from the nano- to microscale with a single laser scan. By controlling the scanning speed and ensuring sufficient pressure and heating depth on the glass surface, 250-nm to 50-μm line- widths and space patterns were embossed in a few seconds with excellent replication fidelity. The laser-assisted hot embossing methods developed in this study facil-itated high-throughput, energy-efficient, reproducible, and highly accurate micro-/nano-patterning of glass surfaces.
format Article
author Lee, Helen May Shian
Ismayuzri, Ishak
Mohd Zairulnizam, Mohd Zawawi
author_facet Lee, Helen May Shian
Ismayuzri, Ishak
Mohd Zairulnizam, Mohd Zawawi
author_sort Lee, Helen May Shian
title Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
title_short Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
title_full Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
title_fullStr Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
title_full_unstemmed Rapid Fabrication of Glass Micro and Nanostructures via Laser-assisted Hot Embossing
title_sort rapid fabrication of glass micro and nanostructures via laser-assisted hot embossing
publisher Japan Laser Processing Society
publishDate 2023
url http://umpir.ump.edu.my/id/eprint/36973/1/SCIE%20Journal_Rapid%20Fabrication%20of%20Glass%20Micro%20and%20Nanostructures%20via%20Laser-assisted.pdf
http://umpir.ump.edu.my/id/eprint/36973/
http://www.jlps.gr.jp/jlmn/
_version_ 1822923320793759744
score 13.251813

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