An application of advanced oxidation process to photopolish palm oil mill effluent over TIO2 and ZnO photocatalysts

The reactivity of both UV/TiO2 and UV/ZnO systems in treating palm oil mill effluent (POME) were investigated in current study. XRD revealed that TiO2 and ZnO, with the band gap energy of 3.15 and 3.20 eV respectively, were free from impurities. ZnO photocatalyst has irregular shape, bigger in parti...

詳細記述

保存先:
書誌詳細
第一著者: Ng, Kim Hoong
フォーマット: 学位論文
言語:English
出版事項: 2017
主題:
オンライン・アクセス:http://umpir.ump.edu.my/id/eprint/19561/1/An%20application%20of%20advanced%20oxidation%20process%20to%20photopolish%20palm%20oil%20mill%20effluent%20over%20TIO2%20and%20ZnO%20photocatalysts..pdf
http://umpir.ump.edu.my/id/eprint/19561/
タグ: タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!