Device characterization based on stressor, geometric and process design considerations of fet technology / Nurul Aida Farhana Othman

The downscaling of complementary metal-oxide-semiconductor (CMOS) device has been tremendously feasible in the past couple of decades. This action has led to a constant escalation of devices count in a dense integrated circuit, hence an outstanding application of Moore’s law to the industry especial...

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主要作者: Nurul Aida Farhana, Othman
格式: Thesis
出版: 2018
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在线阅读:http://studentsrepo.um.edu.my/9990/1/Nurul_Aida_Farhana_Binti_Othman.jpg
http://studentsrepo.um.edu.my/9990/8/aida.pdf
http://studentsrepo.um.edu.my/9990/
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