Hybrid plasma enhanced chemical vapour deposition/sputtering system for preparation of luminescent silicon carbon films / Nur Maisarah binti Abdul Rashid
Radio frequency plasma enhanced chemical vapour deposition (r.f PECVD) process is a well-established technique for depositing amorphous silicon carbon (a-SiC) films. However, an environmental friendly deposition technique which does not involve the use of toxic gas, silane (SiH4) is a much preferred...
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| Format: | Thesis |
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2013
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| Online Access: | http://studentsrepo.um.edu.my/4414/1/THESIS_MSc_NUR_MAISARAH_BINTI_ABDUL_RASHID_SGR090108.pdf http://studentsrepo.um.edu.my/4414/ |
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