Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)

The effect of substrate temperature on the structural property of the silicon nanostructures deposited on gold-coated crystal silicon substrate by hot-wire chemical vapor deposition (HWCVD) was studied. The uniformity and size of the as-grown silicon nanostructures is highly influenced by the substr...

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Main Authors: Chong, S.K., Goh, B.T., Aspanut, Z., Muhamad, M.R., Dee, C.F., Rahman, S.A.
Format: Article
Published: 2011
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Online Access:http://eprints.um.edu.my/7339/
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spelling my.um.eprints.73392014-12-21T08:50:24Z http://eprints.um.edu.my/7339/ Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD) Chong, S.K. Goh, B.T. Aspanut, Z. Muhamad, M.R. Dee, C.F. Rahman, S.A. QC Physics The effect of substrate temperature on the structural property of the silicon nanostructures deposited on gold-coated crystal silicon substrate by hot-wire chemical vapor deposition (HWCVD) was studied. The uniformity and size of the as-grown silicon nanostructures is highly influenced by the substrate temperature. XRD, Raman and HRTEM measurements show the silicon nanostructures consist of small crystallites embedded within amorphous matrix. The crystallite size of the as-grown silicon nanostructures decreases with increases in substrate temperature. FTIR shows that these silicon nanostructures are highly disordered for sample prepared at substrate temperature above 250 degrees C. The correlation of crystallinity and structure disorder of the silicon nanostructures growth at different substrate temperature was discussed. (C) 2010 Elsevier B.V. All rights reserved. 2011 Article PeerReviewed Chong, S.K. and Goh, B.T. and Aspanut, Z. and Muhamad, M.R. and Dee, C.F. and Rahman, S.A. (2011) Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD). Applied Surface Science, 257 (8). pp. 3320-3324. ISSN 0169-4332 10.1016/j.apsusc.2010.11.012
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic QC Physics
spellingShingle QC Physics
Chong, S.K.
Goh, B.T.
Aspanut, Z.
Muhamad, M.R.
Dee, C.F.
Rahman, S.A.
Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
description The effect of substrate temperature on the structural property of the silicon nanostructures deposited on gold-coated crystal silicon substrate by hot-wire chemical vapor deposition (HWCVD) was studied. The uniformity and size of the as-grown silicon nanostructures is highly influenced by the substrate temperature. XRD, Raman and HRTEM measurements show the silicon nanostructures consist of small crystallites embedded within amorphous matrix. The crystallite size of the as-grown silicon nanostructures decreases with increases in substrate temperature. FTIR shows that these silicon nanostructures are highly disordered for sample prepared at substrate temperature above 250 degrees C. The correlation of crystallinity and structure disorder of the silicon nanostructures growth at different substrate temperature was discussed. (C) 2010 Elsevier B.V. All rights reserved.
format Article
author Chong, S.K.
Goh, B.T.
Aspanut, Z.
Muhamad, M.R.
Dee, C.F.
Rahman, S.A.
author_facet Chong, S.K.
Goh, B.T.
Aspanut, Z.
Muhamad, M.R.
Dee, C.F.
Rahman, S.A.
author_sort Chong, S.K.
title Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
title_short Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
title_full Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
title_fullStr Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
title_full_unstemmed Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)
title_sort effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (hwcvd)
publishDate 2011
url http://eprints.um.edu.my/7339/
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score 13.211869