Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application
This paper is on an inductance fine tuning technique which benefits from the idea of varying the number of metal plates of an inductor’s pattern ground shield (PGS) shorted to ground to change its magnetic fields. This technique is unique because the geometry and physical shape of the inductor remai...
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my.um.eprints.229482019-11-27T01:31:21Z http://eprints.um.edu.my/22948/ Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application Yusof, Nur Syahadah Noh, Norlaili Mohd Rajendran, Jagadheswaran Abd Manaf, Asrulnizam Kunhi Mohd, Shukri Korakkottil Mohd. Yusof, Yusman Ramiah, Harikrishnan Packeer Mohamed, Mohamed Fauzi TK Electrical engineering. Electronics Nuclear engineering This paper is on an inductance fine tuning technique which benefits from the idea of varying the number of metal plates of an inductor’s pattern ground shield (PGS) shorted to ground to change its magnetic fields. This technique is unique because the geometry and physical shape of the inductor remains untouched from its form in the process design kit (PDK) while the inductance is being tuned. The number of metal shields shorted to ground was controlled by an electronic circuit which consists of analog-to-digital converters and active switches. Both Sonnet EM simulator and Cadence Virtuoso were used for the inductor and circuit simulations. From the simulation, it was found that the inductance increased while the Q-factor decreased as more metal shields were shorted to ground. For instance, at 1.6 GHz, the simulated inductance was 8.8 nH when all metals were floated and 9.4 nH when all metals were shorted to ground. On the other hand, the simulated Q-factor was 10.4 when all metals were floated and 9.8 when all metals were shorted to ground. From both simulation and measured results, both inductance and inductance tuning range increased with frequency. From the measured results too, the inductance observed was 9.4 nH at 1.6 GHz, 10.8 nH at 2 GHz, and 13.5 nH at 2.5 GHz when all the metal shields were shorted to ground. The inductance tuning range was 6.2% at 1.6 GHz, 12.5% at 2 GHz, and 20% at 2.5 GHz. The measured results showed good correlation with the simulated results trend, but with smaller value of inductance, inductance tuning range and Q-factor. Institute of Advanced Engineering and Science 2019 Article PeerReviewed Yusof, Nur Syahadah and Noh, Norlaili Mohd and Rajendran, Jagadheswaran and Abd Manaf, Asrulnizam and Kunhi Mohd, Shukri Korakkottil and Mohd. Yusof, Yusman and Ramiah, Harikrishnan and Packeer Mohamed, Mohamed Fauzi (2019) Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application. Indonesian Journal of Electrical Engineering and Computer Science, 14 (2). pp. 937-948. ISSN 2502-4752 https://doi.org/10.11591/ijeecs.v14.i2.pp937-948 doi:10.11591/ijeecs.v14.i2.pp937-948 |
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TK Electrical engineering. Electronics Nuclear engineering Yusof, Nur Syahadah Noh, Norlaili Mohd Rajendran, Jagadheswaran Abd Manaf, Asrulnizam Kunhi Mohd, Shukri Korakkottil Mohd. Yusof, Yusman Ramiah, Harikrishnan Packeer Mohamed, Mohamed Fauzi Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
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This paper is on an inductance fine tuning technique which benefits from the idea of varying the number of metal plates of an inductor’s pattern ground shield (PGS) shorted to ground to change its magnetic fields. This technique is unique because the geometry and physical shape of the inductor remains untouched from its form in the process design kit (PDK) while the inductance is being tuned. The number of metal shields shorted to ground was controlled by an electronic circuit which consists of analog-to-digital converters and active switches. Both Sonnet EM simulator and Cadence Virtuoso were used for the inductor and circuit simulations. From the simulation, it was found that the inductance increased while the Q-factor decreased as more metal shields were shorted to ground. For instance, at 1.6 GHz, the simulated inductance was 8.8 nH when all metals were floated and 9.4 nH when all metals were shorted to ground. On the other hand, the simulated Q-factor was 10.4 when all metals were floated and 9.8 when all metals were shorted to ground. From both simulation and measured results, both inductance and inductance tuning range increased with frequency. From the measured results too, the inductance observed was 9.4 nH at 1.6 GHz, 10.8 nH at 2 GHz, and 13.5 nH at 2.5 GHz when all the metal shields were shorted to ground. The inductance tuning range was 6.2% at 1.6 GHz, 12.5% at 2 GHz, and 20% at 2.5 GHz. The measured results showed good correlation with the simulated results trend, but with smaller value of inductance, inductance tuning range and Q-factor. |
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Article |
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Yusof, Nur Syahadah Noh, Norlaili Mohd Rajendran, Jagadheswaran Abd Manaf, Asrulnizam Kunhi Mohd, Shukri Korakkottil Mohd. Yusof, Yusman Ramiah, Harikrishnan Packeer Mohamed, Mohamed Fauzi |
author_facet |
Yusof, Nur Syahadah Noh, Norlaili Mohd Rajendran, Jagadheswaran Abd Manaf, Asrulnizam Kunhi Mohd, Shukri Korakkottil Mohd. Yusof, Yusman Ramiah, Harikrishnan Packeer Mohamed, Mohamed Fauzi |
author_sort |
Yusof, Nur Syahadah |
title |
Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
title_short |
Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
title_full |
Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
title_fullStr |
Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
title_full_unstemmed |
Electronic controlled CMOS inductor with patterned metal ground shields for fine inductance tuning application |
title_sort |
electronic controlled cmos inductor with patterned metal ground shields for fine inductance tuning application |
publisher |
Institute of Advanced Engineering and Science |
publishDate |
2019 |
url |
http://eprints.um.edu.my/22948/ https://doi.org/10.11591/ijeecs.v14.i2.pp937-948 |
_version_ |
1651867380411793408 |
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13.211869 |