Structural, chemical, and electrical properties of ZrO2/Ge system formed via oxidation/nitridation in N2O gas ambient
The effects of oxidation/nitridation for 15 min at different temperatures (300–800 °C) on metal–oxide–semiconductor characteristics of sputtered Zr thin film based on Ge substrate in N2O ambient have been systematically investigated. The crystallinity of the film were evaluated by X-ray diffraction...
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| 主要な著者: | , , |
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| フォーマット: | 論文 |
| 出版事項: |
Springer
2018
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| 主題: | |
| オンライン･アクセス: | http://eprints.um.edu.my/21491/ https://doi.org/10.1007/s10854-018-9408-2 |
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