Dynamic dispersing technique for PR coating process in planar lightwave circuit fabrication
A new dynamic dispersing technique (DDT) is proposed and demonstrated to improve the photoresist (PR) coating process in planar lightwave circuit (PLC) fabrication. In this technique, the PR is dispensed during the wafer's spin cycle on the spin coaler instead of the conventional static dispens...
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| Main Authors: | , , , , |
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| Format: | Article |
| Published: |
John Wiley & Sons
2007
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/19681/ http://dx.doi.org/10.1002/mop.22609 |
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