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Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata

PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, subs...

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Main Authors: Herman, Sukreen Hana, Kimihiro, Sasaki, Tomonobu, Hata
Format: Conference or Workshop Item
Language:English
Published: 2004
Subjects:
Temperature
Electric apparatus and materials. Electric circuits. Electric networks
Oxygen. Ozone
Online Access:https://ir.uitm.edu.my/id/eprint/52734/1/52734.PDF
https://ir.uitm.edu.my/id/eprint/52734/
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spelling my.uitm.ir.527342022-09-23T00:25:52Z https://ir.uitm.edu.my/id/eprint/52734/ Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata Herman, Sukreen Hana Kimihiro, Sasaki Tomonobu, Hata Temperature Electric apparatus and materials. Electric circuits. Electric networks Oxygen. Ozone PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, substrate temperature is 200 (unintentionally heated), 450 and 550°C. PbOz target occupation is 300%. It is confirmed that PbOz pellet target has the potential to be the oxygen-source during the deposition with a high deposition rate. Perovskite PZT peak was observed in XRD measurement for film grown with PbO2 pellet target without introducing, my oxygen gas and with a small target occupation during deposition. 2004 Conference or Workshop Item PeerReviewed text en https://ir.uitm.edu.my/id/eprint/52734/1/52734.PDF Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata. (2004) In: STSS 2004: Sains Teknologi Jilid 1, 31 Mei – 1 Jun 2004, Hotel Vistana, Kuantan, Pahang.
institution Universiti Teknologi Mara
building Tun Abdul Razak Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Mara
content_source UiTM Institutional Repository
url_provider http://ir.uitm.edu.my/
language English
topic Temperature
Electric apparatus and materials. Electric circuits. Electric networks
Oxygen. Ozone
spellingShingle Temperature
Electric apparatus and materials. Electric circuits. Electric networks
Oxygen. Ozone
Herman, Sukreen Hana
Kimihiro, Sasaki
Tomonobu, Hata
Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
description PZT films were prepared on Pt/Ti/SiO2/Si substrate by RF reactive sputtering apparatus using metal-oxide composite ZrTi+PbO2 powder and pellet targets. The main sputtering conditions are as follows: sputtering gas is argon and oxygen, gas pressure is 1810-2Torr, 02/Ar flow rate is 0% and 4.2%, substrate temperature is 200 (unintentionally heated), 450 and 550°C. PbOz target occupation is 300%. It is confirmed that PbOz pellet target has the potential to be the oxygen-source during the deposition with a high deposition rate. Perovskite PZT peak was observed in XRD measurement for film grown with PbO2 pellet target without introducing, my oxygen gas and with a small target occupation during deposition.
format Conference or Workshop Item
author Herman, Sukreen Hana
Kimihiro, Sasaki
Tomonobu, Hata
author_facet Herman, Sukreen Hana
Kimihiro, Sasaki
Tomonobu, Hata
author_sort Herman, Sukreen Hana
title Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
title_short Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
title_full Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
title_fullStr Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
title_full_unstemmed Fabrication and evaluations of PZT thin films by RF reactive sputtering using solid oxygen-source / Sukreen Hana Herman, Kimihiro Sasaki and Tomonobu Hata
title_sort fabrication and evaluations of pzt thin films by rf reactive sputtering using solid oxygen-source / sukreen hana herman, kimihiro sasaki and tomonobu hata
publishDate 2004
url https://ir.uitm.edu.my/id/eprint/52734/1/52734.PDF
https://ir.uitm.edu.my/id/eprint/52734/
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score 13.211869

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