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Study on nanostructured zinc oxide thin films characteristics

The Nano structured zinc oxide (ZnO) materials in thin film have been achieved using electrochemical deposition (ECD) method. The morphology, crystal structure and optical properties of ZnO nanostructures have been characterized. The best potentials for deposition were -1.0V and -1.1V using ECD meth...

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Main Author: Mohd Rodzi, Ana Syahidah
Format: Thesis
Language:English
Published: 2014
Subjects:
Indexes (General)
Online Access:https://ir.uitm.edu.my/id/eprint/13875/2/13875.PDF
https://ir.uitm.edu.my/id/eprint/13875/
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spelling my.uitm.ir.138752025-01-01T15:10:28Z https://ir.uitm.edu.my/id/eprint/13875/ Study on nanostructured zinc oxide thin films characteristics Mohd Rodzi, Ana Syahidah Indexes (General) The Nano structured zinc oxide (ZnO) materials in thin film have been achieved using electrochemical deposition (ECD) method. The morphology, crystal structure and optical properties of ZnO nanostructures have been characterized. The best potentials for deposition were -1.0V and -1.1V using ECD method. Analysis using (FESEM) showed that ZnO nanoparticles and nanorods growths uniformly. The XRD patterns of ZnO nanostructure thin films shows evident in good arrangement of crystal structure properties that has been investigated in high deposited temperature at 95 °C and annealed at 500 °C. It is proved that ZnO thin film texture surface with the c-axis perpendicular to the substrate surface. Deposition of ZnO seed catalysis growth of hexagonal wurtzite structure of ZnO and exhibited good arrangement of ZnO nanorods growth investigated at -1.0V, -1.1V, -1.2V, 1.3 V and -1.4V of the potential applied. The highest transmittance spectra of -1.0V potential applied showed 80% transmittance spectra compared to that of other potentials which deposited at high deposition temperature. F or piezoelectric properties, results at -1.0 V, -1.1 V and -1.2 V of ZnO thin films can give signal corresponding to the average of current output600 nA, 200 |iA and 50 |iA, respectively. As a conclusion, the excellent ZnO nanostructures properties growth by ECD method has been achieved for the best deposition potential at -1.0 V and -1.1 V. Otherwise to improve the crystallites of ZnO has been prepared at high temperature deposition 95 °C compare low temperature deposition. The high percentage transmittance has been exhibited at 80% after annealed in oxygen furnace to improve the optical properties. 2014 Thesis NonPeerReviewed text en https://ir.uitm.edu.my/id/eprint/13875/2/13875.PDF Study on nanostructured zinc oxide thin films characteristics. (2014) Masters thesis, thesis, Universiti Teknologi MARA.
institution Universiti Teknologi Mara
building Tun Abdul Razak Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Mara
content_source UiTM Institutional Repository
url_provider http://ir.uitm.edu.my/
language English
topic Indexes (General)
spellingShingle Indexes (General)
Mohd Rodzi, Ana Syahidah
Study on nanostructured zinc oxide thin films characteristics
description The Nano structured zinc oxide (ZnO) materials in thin film have been achieved using electrochemical deposition (ECD) method. The morphology, crystal structure and optical properties of ZnO nanostructures have been characterized. The best potentials for deposition were -1.0V and -1.1V using ECD method. Analysis using (FESEM) showed that ZnO nanoparticles and nanorods growths uniformly. The XRD patterns of ZnO nanostructure thin films shows evident in good arrangement of crystal structure properties that has been investigated in high deposited temperature at 95 °C and annealed at 500 °C. It is proved that ZnO thin film texture surface with the c-axis perpendicular to the substrate surface. Deposition of ZnO seed catalysis growth of hexagonal wurtzite structure of ZnO and exhibited good arrangement of ZnO nanorods growth investigated at -1.0V, -1.1V, -1.2V, 1.3 V and -1.4V of the potential applied. The highest transmittance spectra of -1.0V potential applied showed 80% transmittance spectra compared to that of other potentials which deposited at high deposition temperature. F or piezoelectric properties, results at -1.0 V, -1.1 V and -1.2 V of ZnO thin films can give signal corresponding to the average of current output600 nA, 200 |iA and 50 |iA, respectively. As a conclusion, the excellent ZnO nanostructures properties growth by ECD method has been achieved for the best deposition potential at -1.0 V and -1.1 V. Otherwise to improve the crystallites of ZnO has been prepared at high temperature deposition 95 °C compare low temperature deposition. The high percentage transmittance has been exhibited at 80% after annealed in oxygen furnace to improve the optical properties.
format Thesis
author Mohd Rodzi, Ana Syahidah
author_facet Mohd Rodzi, Ana Syahidah
author_sort Mohd Rodzi, Ana Syahidah
title Study on nanostructured zinc oxide thin films characteristics
title_short Study on nanostructured zinc oxide thin films characteristics
title_full Study on nanostructured zinc oxide thin films characteristics
title_fullStr Study on nanostructured zinc oxide thin films characteristics
title_full_unstemmed Study on nanostructured zinc oxide thin films characteristics
title_sort study on nanostructured zinc oxide thin films characteristics
publishDate 2014
url https://ir.uitm.edu.my/id/eprint/13875/2/13875.PDF
https://ir.uitm.edu.my/id/eprint/13875/
_version_ 1821006263272603648
score 13.235796

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