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RF magnetron sputtered YSZ thin film: Fabrication and characterizations

In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method...

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Main Authors:	Meskon, Shahrul Razi, Sutjipto, Agus Geter Edy, Ani, Mohd Hanafi, Othman, Raihan
Format:	Conference or Workshop Item
Language:	English
Published:	2010
Subjects:	TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion
Online Access:	http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf http://irep.iium.edu.my/6720/ http://umconference.um.edu.my/ICFMD2010
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spelling	my.iium.irep.67202011-12-19T06:00:45Z http://irep.iium.edu.my/6720/ RF magnetron sputtered YSZ thin film: Fabrication and characterizations Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C. 2010-06-14 Conference or Workshop Item REM application/pdf en http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf Meskon, Shahrul Razi and Sutjipto, Agus Geter Edy and Ani, Mohd Hanafi and Othman, Raihan (2010) RF magnetron sputtered YSZ thin film: Fabrication and characterizations. In: 3rd International Conference on Functional Materials and Devices 2010, 13-17 June 2010, Kuala Terengganu, Terengganu, Malaysia. (Unpublished) http://umconference.um.edu.my/ICFMD2010
institution	Universiti Islam Antarabangsa Malaysia
building	IIUM Library
collection	Institutional Repository
continent	Asia
country	Malaysia
content_provider	International Islamic University Malaysia
content_source	IIUM Repository (IREP)
url_provider	http://irep.iium.edu.my/
language	English
topic	TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion
spellingShingle	TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan RF magnetron sputtered YSZ thin film: Fabrication and characterizations
description	In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C.
format	Conference or Workshop Item
author	Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan
author_facet	Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan
author_sort	Meskon, Shahrul Razi
title	RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_short	RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_full	RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_fullStr	RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_full_unstemmed	RF magnetron sputtered YSZ thin film: Fabrication and characterizations
title_sort	rf magnetron sputtered ysz thin film: fabrication and characterizations
publishDate	2010
url	http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf http://irep.iium.edu.my/6720/ http://umconference.um.edu.my/ICFMD2010
_version_	1643605797864734720
score	13.211869

RF magnetron sputtered YSZ thin film: Fabrication and characterizations

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