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Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices

Graphene is a promising electrode material not only due to its intrinsic properties like good electrical conductivity, high mechanical strength and high chemical stability, but also because of its high theoretical surface area of 2630 m2 g−1. In this report, the effect of CVD parameters to the growt...

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Main Authors: Mohd Abid, Mohd Asyadi Azam, Zulkapli, Nor Najihah, Dorah, Norasimah, Raja Seman, Raja Noor Amalina, Ani, Mohd Hanafi, Sirat, Mohd Shukri, Ismail, Edhuan, Fauzi, Fatin Bazilah, Mohamed, Mohd Ambri, Majlis, Burhanuddin Yeop
Format: Article
Language:English
English
Published: Electrochemical Society (ECS) 2017
Subjects:
TA Engineering (General). Civil engineering (General)
TA401 Materials of engineering and construction
Online Access:http://irep.iium.edu.my/54933/1/54933_Review-Critical%20Consideration.pdf
http://irep.iium.edu.my/54933/2/54933_Review-Critical%20Consideration_WOS.pdf
http://irep.iium.edu.my/54933/
http://jss.ecsdl.org/content/6/6/M3035.full.pdf+html
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spelling my.iium.irep.549332017-07-14T04:01:42Z http://irep.iium.edu.my/54933/ Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices Mohd Abid, Mohd Asyadi Azam Zulkapli, Nor Najihah Dorah, Norasimah Raja Seman, Raja Noor Amalina Ani, Mohd Hanafi Sirat, Mohd Shukri Ismail, Edhuan Fauzi, Fatin Bazilah Mohamed, Mohd Ambri Majlis, Burhanuddin Yeop TA Engineering (General). Civil engineering (General) TA401 Materials of engineering and construction Graphene is a promising electrode material not only due to its intrinsic properties like good electrical conductivity, high mechanical strength and high chemical stability, but also because of its high theoretical surface area of 2630 m2 g−1. In this report, the effect of CVD parameters to the growth of high quality graphene on metal substrates by using plasma enhanced chemical vapor deposition (PECVD) was extensively studied. Interestingly, synthesizing high quality graphene by PECVD technique is not only depending on the CVD parameters, but also depending on the catalysts and its plasma sources. It was found that Ni and Cu are the most favored metal catalysts for PECVD graphene growth. With high solubility of carbon (> 0.1 at. %), Ni effectively promote the growth of multilayer graphene by PECVD. However, large-area synthesis has made relatively inexpensive Cu as one of the most attractive substrates for monolayer graphene growth. Further details on the potential use of different transition metal catalysts in synthesizing graphene and consequently the specific usage of graphene based devices are discussed in this report. Electrochemical Society (ECS) 2017-01-19 Article REM application/pdf en http://irep.iium.edu.my/54933/1/54933_Review-Critical%20Consideration.pdf application/pdf en http://irep.iium.edu.my/54933/2/54933_Review-Critical%20Consideration_WOS.pdf Mohd Abid, Mohd Asyadi Azam and Zulkapli, Nor Najihah and Dorah, Norasimah and Raja Seman, Raja Noor Amalina and Ani, Mohd Hanafi and Sirat, Mohd Shukri and Ismail, Edhuan and Fauzi, Fatin Bazilah and Mohamed, Mohd Ambri and Majlis, Burhanuddin Yeop (2017) Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices. ECS Journal of Solid State Science and Technology, 6 (6). M3035-M3048. ISSN 2162-8769 http://jss.ecsdl.org/content/6/6/M3035.full.pdf+html 10.1149/2.0031706jss
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
English
topic TA Engineering (General). Civil engineering (General)
TA401 Materials of engineering and construction
spellingShingle TA Engineering (General). Civil engineering (General)
TA401 Materials of engineering and construction
Mohd Abid, Mohd Asyadi Azam
Zulkapli, Nor Najihah
Dorah, Norasimah
Raja Seman, Raja Noor Amalina
Ani, Mohd Hanafi
Sirat, Mohd Shukri
Ismail, Edhuan
Fauzi, Fatin Bazilah
Mohamed, Mohd Ambri
Majlis, Burhanuddin Yeop
Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
description Graphene is a promising electrode material not only due to its intrinsic properties like good electrical conductivity, high mechanical strength and high chemical stability, but also because of its high theoretical surface area of 2630 m2 g−1. In this report, the effect of CVD parameters to the growth of high quality graphene on metal substrates by using plasma enhanced chemical vapor deposition (PECVD) was extensively studied. Interestingly, synthesizing high quality graphene by PECVD technique is not only depending on the CVD parameters, but also depending on the catalysts and its plasma sources. It was found that Ni and Cu are the most favored metal catalysts for PECVD graphene growth. With high solubility of carbon (> 0.1 at. %), Ni effectively promote the growth of multilayer graphene by PECVD. However, large-area synthesis has made relatively inexpensive Cu as one of the most attractive substrates for monolayer graphene growth. Further details on the potential use of different transition metal catalysts in synthesizing graphene and consequently the specific usage of graphene based devices are discussed in this report.
format Article
author Mohd Abid, Mohd Asyadi Azam
Zulkapli, Nor Najihah
Dorah, Norasimah
Raja Seman, Raja Noor Amalina
Ani, Mohd Hanafi
Sirat, Mohd Shukri
Ismail, Edhuan
Fauzi, Fatin Bazilah
Mohamed, Mohd Ambri
Majlis, Burhanuddin Yeop
author_facet Mohd Abid, Mohd Asyadi Azam
Zulkapli, Nor Najihah
Dorah, Norasimah
Raja Seman, Raja Noor Amalina
Ani, Mohd Hanafi
Sirat, Mohd Shukri
Ismail, Edhuan
Fauzi, Fatin Bazilah
Mohamed, Mohd Ambri
Majlis, Burhanuddin Yeop
author_sort Mohd Abid, Mohd Asyadi Azam
title Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
title_short Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
title_full Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
title_fullStr Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
title_full_unstemmed Review—Critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
title_sort review—critical considerations of high quality graphene synthesized by plasma-enhanced chemical vapor deposition for electronic and energy storage devices
publisher Electrochemical Society (ECS)
publishDate 2017
url http://irep.iium.edu.my/54933/1/54933_Review-Critical%20Consideration.pdf
http://irep.iium.edu.my/54933/2/54933_Review-Critical%20Consideration_WOS.pdf
http://irep.iium.edu.my/54933/
http://jss.ecsdl.org/content/6/6/M3035.full.pdf+html
_version_ 1643614644339736576
score 13.211869

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