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Development of low normal force contact using electro fine forming and lithography technology

This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at...

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Bibliographic Details
Main Authors: Bhuiyan, Moinul, Yamada, Shinji, Kurokawa, Noriharu, Sakamoto, Katsuhiko, Takemasa, Eiichiro
Format: Conference or Workshop Item
Language:English
English
Published: 2008
Subjects:
TA401 Materials of engineering and construction
Online Access:http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf
http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg
http://irep.iium.edu.my/33190/
http://www.te.com/en/home.html
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http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf
http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg
http://irep.iium.edu.my/33190/
http://www.te.com/en/home.html

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