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Quality of copper film electroplated on silicon wafer using different current densities

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Main Author: Mridha, Shahjahan
Format: Book Chapter
Language:English
Published: IIUM Press 2011
Subjects:
TP1080 Polymers, plastics and their manufacture
Online Access:http://irep.iium.edu.my/19027/1/Chapter_6.pdf
http://irep.iium.edu.my/19027/
http://rms.research.iium.edu.my/bookstore/default.aspx
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spelling my.iium.irep.190272012-09-21T08:14:26Z http://irep.iium.edu.my/19027/ Quality of copper film electroplated on silicon wafer using different current densities Mridha, Shahjahan TP1080 Polymers, plastics and their manufacture IIUM Press 2011 Book Chapter REM application/pdf en http://irep.iium.edu.my/19027/1/Chapter_6.pdf Mridha, Shahjahan (2011) Quality of copper film electroplated on silicon wafer using different current densities. In: Advances in materials engineering. IIUM Press, Kuala Lumpur, pp. 28-38. ISBN 9789674181673 http://rms.research.iium.edu.my/bookstore/default.aspx
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
topic TP1080 Polymers, plastics and their manufacture
spellingShingle TP1080 Polymers, plastics and their manufacture
Mridha, Shahjahan
Quality of copper film electroplated on silicon wafer using different current densities
format Book Chapter
author Mridha, Shahjahan
author_facet Mridha, Shahjahan
author_sort Mridha, Shahjahan
title Quality of copper film electroplated on silicon wafer using different current densities
title_short Quality of copper film electroplated on silicon wafer using different current densities
title_full Quality of copper film electroplated on silicon wafer using different current densities
title_fullStr Quality of copper film electroplated on silicon wafer using different current densities
title_full_unstemmed Quality of copper film electroplated on silicon wafer using different current densities
title_sort quality of copper film electroplated on silicon wafer using different current densities
publisher IIUM Press
publishDate 2011
url http://irep.iium.edu.my/19027/1/Chapter_6.pdf
http://irep.iium.edu.my/19027/
http://rms.research.iium.edu.my/bookstore/default.aspx
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score 13.211869

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