Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface
Nanospheres made of organic polymer have been applied to generate various patterning mask in fabricating functional nanostructures. The patterning and generation of semiconductor nanostructures through nanospheres mask provides a potential alternative to the conventional top-down fabrication techniq...
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| Language: | en |
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2017
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| author | Yabagi, Jibrin Alhaji Kimpa, Mohammed Isah Muhammad, Muhammad Nmaya Nayan, Nafarizal Embong, Zaidi Agam, Mohd Arif |
| author_facet | Yabagi, Jibrin Alhaji Kimpa, Mohammed Isah Muhammad, Muhammad Nmaya Nayan, Nafarizal Embong, Zaidi Agam, Mohd Arif |
| author_sort | Yabagi, Jibrin Alhaji |
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| content_provider | Universiti Tun Hussein Onn Malaysia |
| content_source | UTHM Institutional Repository |
| continent | Asia |
| country | Malaysia |
| description | Nanospheres made of organic polymer have been applied to generate various patterning mask in fabricating functional nanostructures. The patterning and generation of semiconductor nanostructures through nanospheres mask provides a potential alternative to the conventional top-down fabrication techniques. Polystyrene nanosphere was modified using reactive ion etching (RIE) with O2 plasma at various duration of exposure (0, 20, 40 sec) and further extended to produce nanostructure by employing combination of O2 and mixed CHF3/SF6 gases. These edge PS nanospheres are later reduced as nanostructures and characterized using various characterization techniques such as Field Emission Scan Electron Microscopy/Energy Dispersive X-ray Spectroscopy (FESEM)/EDS, Atomic Force Microscopy and Fourier Transformation Infrared Spectroscopy (FTIR). The potential for multi stages etching procedures of O2 and later with SF6/CHF3 plasma etching are found to modify the nanospheres shapes and sizes which are important either as secondary mask for metal evaporation or as direct patterning of carbonaceous materials when exposed to irradiation sources. The nanostructures made using RIE will have applications in low power high performance electronic devices, optoelectronic, photovoltaic, biosensors and lithium ion battery devices. |
| format | Article |
| id | my.uthm.eprints-4852 |
| institution | Universiti Tun Hussein Onn Malaysia |
| language | en |
| publishDate | 2017 |
| publisher | UTHM Publisher |
| record_format | eprints |
| spelling | my.uthm.eprints-48522021-12-21T07:39:56Z http://eprints.uthm.edu.my/4852/ Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface Yabagi, Jibrin Alhaji Kimpa, Mohammed Isah Muhammad, Muhammad Nmaya Nayan, Nafarizal Embong, Zaidi Agam, Mohd Arif T Technology (General) TA401-492 Materials of engineering and construction. Mechanics of materials Nanospheres made of organic polymer have been applied to generate various patterning mask in fabricating functional nanostructures. The patterning and generation of semiconductor nanostructures through nanospheres mask provides a potential alternative to the conventional top-down fabrication techniques. Polystyrene nanosphere was modified using reactive ion etching (RIE) with O2 plasma at various duration of exposure (0, 20, 40 sec) and further extended to produce nanostructure by employing combination of O2 and mixed CHF3/SF6 gases. These edge PS nanospheres are later reduced as nanostructures and characterized using various characterization techniques such as Field Emission Scan Electron Microscopy/Energy Dispersive X-ray Spectroscopy (FESEM)/EDS, Atomic Force Microscopy and Fourier Transformation Infrared Spectroscopy (FTIR). The potential for multi stages etching procedures of O2 and later with SF6/CHF3 plasma etching are found to modify the nanospheres shapes and sizes which are important either as secondary mask for metal evaporation or as direct patterning of carbonaceous materials when exposed to irradiation sources. The nanostructures made using RIE will have applications in low power high performance electronic devices, optoelectronic, photovoltaic, biosensors and lithium ion battery devices. UTHM Publisher 2017 Article PeerReviewed text en http://eprints.uthm.edu.my/4852/1/AJ%202017%20%28674%29.pdf Yabagi, Jibrin Alhaji and Kimpa, Mohammed Isah and Muhammad, Muhammad Nmaya and Nayan, Nafarizal and Embong, Zaidi and Agam, Mohd Arif (2017) Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface. Journal of Science and Technology, 9 (3). pp. 145-153. ISSN 2229-8460 |
| spellingShingle | T Technology (General) TA401-492 Materials of engineering and construction. Mechanics of materials Yabagi, Jibrin Alhaji Kimpa, Mohammed Isah Muhammad, Muhammad Nmaya Nayan, Nafarizal Embong, Zaidi Agam, Mohd Arif Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title | Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title_full | Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title_fullStr | Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title_full_unstemmed | Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title_short | Nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| title_sort | nanofabrication process by reactive ion etching of polystyrene nanosphere on silicon surface |
| topic | T Technology (General) TA401-492 Materials of engineering and construction. Mechanics of materials |
| url | http://eprints.uthm.edu.my/4852/1/AJ%202017%20%28674%29.pdf http://eprints.uthm.edu.my/4852/ |
| url_provider | http://eprints.uthm.edu.my/ |