Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering
Silicon nitride thin films have numerous applications in microelectronics and optoelectronics fields due to their unique properties. In this work, silicon nitride thin films were produced using radio frequency (R.F.) magnetron sputtering technique at various sputtering powers. The prepared thin film...
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Science Publishing Corporation
2018
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| author | Mustafa, Mohd Kamarulzaki Majeed, Uzair Iqbal, Younas |
| author_facet | Mustafa, Mohd Kamarulzaki Majeed, Uzair Iqbal, Younas |
| author_sort | Mustafa, Mohd Kamarulzaki |
| building | UTHM Library |
| collection | Institutional Repository |
| content_provider | Universiti Tun Hussein Onn Malaysia |
| content_source | UTHM Institutional Repository |
| continent | Asia |
| country | Malaysia |
| description | Silicon nitride thin films have numerous applications in microelectronics and optoelectronics fields due to their unique properties. In this work, silicon nitride thin films were produced using radio frequency (R.F.) magnetron sputtering technique at various sputtering powers. The prepared thin films were characterized with XRD, FE-SEM, FTIR, surface profiler, AFM and spectral reflectance techniques for structure, surface morphology, chemical bonding information, growth rate, surface roughness and optical properties. The results showed that silicon nitride thin films were amorphous in nature. The films were smooth and densely packed with no voids or cracks at the surface. FTIR characterization informed about Si-N bonding existence which confirmed the formation of silicon nitride films. The sputtering power showed the impetus effect on growth rate, surface roughness and optical properties of produced films. |
| format | Article |
| id | my.uthm.eprints-4514 |
| institution | Universiti Tun Hussein Onn Malaysia |
| publishDate | 2018 |
| publisher | Science Publishing Corporation |
| record_format | eprints |
| spelling | my.uthm.eprints-45142021-12-07T04:45:29Z http://eprints.uthm.edu.my/4514/ Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering Mustafa, Mohd Kamarulzaki Majeed, Uzair Iqbal, Younas TK7800-8360 Electronics TP155-156 Chemical engineering Silicon nitride thin films have numerous applications in microelectronics and optoelectronics fields due to their unique properties. In this work, silicon nitride thin films were produced using radio frequency (R.F.) magnetron sputtering technique at various sputtering powers. The prepared thin films were characterized with XRD, FE-SEM, FTIR, surface profiler, AFM and spectral reflectance techniques for structure, surface morphology, chemical bonding information, growth rate, surface roughness and optical properties. The results showed that silicon nitride thin films were amorphous in nature. The films were smooth and densely packed with no voids or cracks at the surface. FTIR characterization informed about Si-N bonding existence which confirmed the formation of silicon nitride films. The sputtering power showed the impetus effect on growth rate, surface roughness and optical properties of produced films. Science Publishing Corporation 2018 Article PeerReviewed Mustafa, Mohd Kamarulzaki and Majeed, Uzair and Iqbal, Younas (2018) Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering. International Journal of Engineering and Technology, 7 (4.3). pp. 39-41. ISSN 2227-524X |
| spellingShingle | TK7800-8360 Electronics TP155-156 Chemical engineering Mustafa, Mohd Kamarulzaki Majeed, Uzair Iqbal, Younas Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title | Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title_full | Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title_fullStr | Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title_full_unstemmed | Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title_short | Effect on silicon nitride thin films properties at various powers of RF magnetron sputtering |
| title_sort | effect on silicon nitride thin films properties at various powers of rf magnetron sputtering |
| topic | TK7800-8360 Electronics TP155-156 Chemical engineering |
| url | http://eprints.uthm.edu.my/4514/ |
| url_provider | http://eprints.uthm.edu.my/ |