Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method
Two-steps hydrothermal were demonstrated to create a high efficiently interfacial layer of TiO2 thin film. The first hydrothermal was conducted to synthesize a well-aligned and compact structure of TiO2 nanorods on FTO substrate. Etching treatment in an acidic medium of hydrochloric acid (HCI) as a...
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| Language: | en |
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2024
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| Online Access: | http://eprints.uthm.edu.my/12512/1/J17998_7c7a6ed3f2bd27bdd51c378b16fb219e.pdf http://eprints.uthm.edu.my/12512/ |
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| author | Farizaa, M. Norazlinab, A. Azman, T. Ahmada, M. K. Murakami, K. |
| author_facet | Farizaa, M. Norazlinab, A. Azman, T. Ahmada, M. K. Murakami, K. |
| author_sort | Farizaa, M. |
| building | UTHM Library |
| collection | Institutional Repository |
| content_provider | Universiti Tun Hussein Onn Malaysia |
| content_source | UTHM Institutional Repository |
| continent | Asia |
| country | Malaysia |
| description | Two-steps hydrothermal were demonstrated to create a high efficiently interfacial layer of TiO2 thin film. The first hydrothermal was conducted to synthesize a well-aligned and compact structure of TiO2 nanorods on FTO substrate. Etching treatment in an acidic medium of hydrochloric acid (HCI) as a second hydrothermal favors increasing the surface area prior to any deposition to be a heterostructure film. The morphology of nanorods changed while the electrical resistivity decreased, demonstrating that the etching treatment had a substantial effect on the TiO2 thin film properties. Cyclic voltammetry (CV) was conducted prior deposition. The electrodeposition of Cu20 on the TiO2 thin film was fabricated by using copper acetate-based solution with pH value of 12.0 at bath temperature of 60°C. The finding revealed that the pyramidal structure of Cu20 film was deposited uniformly, which is believed that the properties of TiO2 interfacial layer were excellently improved. |
| format | Article |
| id | my.uthm.eprints-12512 |
| institution | Universiti Tun Hussein Onn Malaysia |
| language | en |
| publishDate | 2024 |
| record_format | eprints |
| spelling | my.uthm.eprints-125122025-05-05T06:36:47Z http://eprints.uthm.edu.my/12512/ Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method Farizaa, M. Norazlinab, A. Azman, T. Ahmada, M. K. Murakami, K. TA Engineering (General). Civil engineering (General) Two-steps hydrothermal were demonstrated to create a high efficiently interfacial layer of TiO2 thin film. The first hydrothermal was conducted to synthesize a well-aligned and compact structure of TiO2 nanorods on FTO substrate. Etching treatment in an acidic medium of hydrochloric acid (HCI) as a second hydrothermal favors increasing the surface area prior to any deposition to be a heterostructure film. The morphology of nanorods changed while the electrical resistivity decreased, demonstrating that the etching treatment had a substantial effect on the TiO2 thin film properties. Cyclic voltammetry (CV) was conducted prior deposition. The electrodeposition of Cu20 on the TiO2 thin film was fabricated by using copper acetate-based solution with pH value of 12.0 at bath temperature of 60°C. The finding revealed that the pyramidal structure of Cu20 film was deposited uniformly, which is believed that the properties of TiO2 interfacial layer were excellently improved. 2024 Article PeerReviewed text en http://eprints.uthm.edu.my/12512/1/J17998_7c7a6ed3f2bd27bdd51c378b16fb219e.pdf Farizaa, M. and Norazlinab, A. and Azman, T. and Ahmada, M. K. and Murakami, K. (2024) Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method. International Journal of Nanoelectronics and Materials. pp. 7-12. ISSN 2232-1535 |
| spellingShingle | TA Engineering (General). Civil engineering (General) Farizaa, M. Norazlinab, A. Azman, T. Ahmada, M. K. Murakami, K. Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method |
| title | Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step
Hydrothermal and Potentiostatic Deposition Method |
| title_full | Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step
Hydrothermal and Potentiostatic Deposition Method |
| title_fullStr | Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step
Hydrothermal and Potentiostatic Deposition Method |
| title_full_unstemmed | Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step
Hydrothermal and Potentiostatic Deposition Method |
| title_short | Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step
Hydrothermal and Potentiostatic Deposition Method |
| title_sort | properties enhancement of cu2o/tio2 heterostructure film using two-step
hydrothermal and potentiostatic deposition method |
| topic | TA Engineering (General). Civil engineering (General) |
| url | http://eprints.uthm.edu.my/12512/1/J17998_7c7a6ed3f2bd27bdd51c378b16fb219e.pdf http://eprints.uthm.edu.my/12512/ |
| url_provider | http://eprints.uthm.edu.my/ |