Lau, K. T., Zurianee, L. L., & Roslan, A. S. (2015). Arc Vapour Deposition Of Iron Film During Magnetron Sputtering Of Ti Film: Effect Of Substrate’s Materials And Surface Roughness. Electrochemical Science Group.
Chicago Style (17th ed.) CitationLau, Kok Tee, Lokman Loganathan Zurianee, and Abd. Shukor Roslan. Arc Vapour Deposition Of Iron Film During Magnetron Sputtering Of Ti Film: Effect Of Substrate’s Materials And Surface Roughness. Electrochemical Science Group, 2015.
MLA (9th ed.) CitationLau, Kok Tee, et al. Arc Vapour Deposition Of Iron Film During Magnetron Sputtering Of Ti Film: Effect Of Substrate’s Materials And Surface Roughness. Electrochemical Science Group, 2015.
Warning: These citations may not always be 100% accurate.