Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target
TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | en |
| Published: |
Trans Tech Publications, Switzerland
2013
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| Subjects: | |
| Online Access: | http://eprints.utem.edu.my/id/eprint/10954/1/Wai_Loon_2.pdf http://eprints.utem.edu.my/id/eprint/10954/ http://www.scopus.com/results/results.url?sort=plf-f&src=s&st1=z.m.rosli&sid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpVrjSeqQ%3a40&sot=b&sdt=b&sl=22&s=AUTHOR-NAME%28z.m.rosli%29&origin=searchbasic&txGid=FD010EC1B79325833808BC93B26574F7.CnvicAmOODVwpV |
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| Summary: | TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On theother hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers). |
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