APA (7th ed.) Citation

Fauziyah, S., Ahmad, I., Fazrena, A. H., & Azami , Z. (2011). Influence of HALO and source/drain implantation on threshold voltage in 45nm PMOS device. International Network for Scientific Information Publication (INSI).

Chicago Style (17th ed.) Citation

Fauziyah, Salehuddin, Ibrahim Ahmad, Azlee Hamid Fazrena, and Zaharim Azami. Influence of HALO and Source/drain Implantation on Threshold Voltage in 45nm PMOS Device. International Network for Scientific Information Publication (INSI), 2011.

MLA (9th ed.) Citation

Fauziyah, Salehuddin, et al. Influence of HALO and Source/drain Implantation on Threshold Voltage in 45nm PMOS Device. International Network for Scientific Information Publication (INSI), 2011.