Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolith...

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Main Author: Siow, Yuen Tien
Format: Thesis
Language:en
Published: 2008
Subjects:
Online Access:http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf
http://eprints.usm.my/9613/
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author Siow, Yuen Tien
author_facet Siow, Yuen Tien
author_sort Siow, Yuen Tien
building Hamzah Sendut Library
collection Institutional Repository
content_provider Universiti Sains Malaysia
content_source USM Institutional Repository
continent Asia
country Malaysia
description Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography
format Thesis
id my.usm.eprints.9613
institution Universiti Sains Malaysia
language en
publishDate 2008
record_format eprints
spelling my.usm.eprints.9613 http://eprints.usm.my/9613/ Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Siow, Yuen Tien TR925-1050 Photomechanical processes Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithography 2008-11 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf Siow, Yuen Tien (2008) Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb]. Masters thesis, Universiti Sains Malaysia.
spellingShingle TR925-1050 Photomechanical processes
Siow, Yuen Tien
Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_fullStr Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_full_unstemmed Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_short Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].
title_sort cycle time analysis for photolithography tools in semiconductor manufacturing industry with simulation model : a case study [tr940. s618 2008 f rb].
topic TR925-1050 Photomechanical processes
url http://eprints.usm.my/9613/1/CYCLE_TIME_ANALYSIS_FOR_PHOTOLITHOGRAPHY_TOOLS_IN.pdf
http://eprints.usm.my/9613/
url_provider http://eprints.usm.my/