Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]

Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future c...

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Main Author: Lim, Alex Ying Kiat
Format: Thesis
Language:en
Published: 2004
Subjects:
Online Access:http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf
http://eprints.usm.my/3087/
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author Lim, Alex Ying Kiat
author_facet Lim, Alex Ying Kiat
author_sort Lim, Alex Ying Kiat
building Hamzah Sendut Library
collection Institutional Repository
content_provider Universiti Sains Malaysia
content_source USM Institutional Repository
continent Asia
country Malaysia
description Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication.
format Thesis
id my.usm.eprints.3087
institution Universiti Sains Malaysia
language en
publishDate 2004
record_format eprints
spelling my.usm.eprints.3087 http://eprints.usm.my/3087/ Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649] Lim, Alex Ying Kiat QC501-766 Electricity and magnetism Objektif kajian ini adalah untuk mengkaji keberkesanan mendopkan sebatian karbon keatas SiO2 untuk menghasilkan bahan dielektrik k rendah. The semiconductor industry is entering a new millennium where scientists and engineers are continuing to search for the ideal dielectric material for future chip fabrication. 2004-03 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf Lim, Alex Ying Kiat (2004) Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]. Masters thesis, Universiti Sains Malaysia.
spellingShingle QC501-766 Electricity and magnetism
Lim, Alex Ying Kiat
Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title_full Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title_fullStr Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title_full_unstemmed Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title_short Carbon Doped Silicon Dioxide Low K Dielectric Material.[QC585.75.S55 L732 2004 f rb][Microfiche 7649]
title_sort carbon doped silicon dioxide low k dielectric material.[qc585.75.s55 l732 2004 f rb][microfiche 7649]
topic QC501-766 Electricity and magnetism
url http://eprints.usm.my/3087/1/QC585.75.S55_L732_2004_f_rb-Carbon_doped_silicon_dioxide_low_K_dielectric_material-_by_Alex_Lim_Ying_Kiat-Fizik-Microfiche_7649.pdf
http://eprints.usm.my/3087/
url_provider http://eprints.usm.my/