APA (7th ed.) Citation

N.H.A, R., N, A., T.S, K., K, S., M, A., & 54397656800. (2023). Create High-Aspect-Ratio Silicon Nanostructures Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc.

Chicago Style (17th ed.) Citation

N.H.A, Razak, Amin N, Kiong T.S, Sopian K, Akhtaruzzaman M, and 54397656800. Create High-Aspect-Ratio Silicon Nanostructures Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc, 2023.

MLA (9th ed.) Citation

N.H.A, Razak, et al. Create High-Aspect-Ratio Silicon Nanostructures Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc, 2023.