APA (7th ed.) Citation

N.H.A, R., N, A., T.S, K., K, S., M, A., & 54397656800. (2023). High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc.

Chicago Style (17th ed.) Citation

N.H.A, Razak, Amin N, Kiong T.S, Sopian K, Akhtaruzzaman M, and 54397656800. High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc, 2023.

MLA (9th ed.) Citation

N.H.A, Razak, et al. High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique. Institute of Electrical and Electronics Engineers Inc, 2023.