Mask design and fabrication of LiSFET for light sensor application
Link to publisher's homepage at http://ieeexplore.ieee.org
Saved in:
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Language: | en |
| Published: |
Institute of Electrical and Electronics Engineering (IEEE)
2009
|
| Subjects: | |
| Online Access: | http://dspace.unimap.edu.my/123456789/7366 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1831782378832396288 |
|---|---|
| author | Uda, Hashim Kasim, Abdul Rahman Amir Razif Arief, Jamil Abdullah |
| author2 | uda@unimap.edu.my |
| author_facet | uda@unimap.edu.my Uda, Hashim Kasim, Abdul Rahman Amir Razif Arief, Jamil Abdullah |
| author_sort | Uda, Hashim |
| building | UniMAP Library |
| collection | Institutional Repository |
| content_provider | Universiti Malaysia Perlis |
| content_source | UniMAP Library Digital Repository |
| continent | Asia |
| country | Malaysia |
| description | Link to publisher's homepage at http://ieeexplore.ieee.org |
| format | Article |
| id | my.unimap-7366 |
| institution | Universiti Malaysia Perlis |
| language | en |
| publishDate | 2009 |
| publisher | Institute of Electrical and Electronics Engineering (IEEE) |
| record_format | dspace |
| spelling | my.unimap-73662014-09-02T07:49:36Z Mask design and fabrication of LiSFET for light sensor application Uda, Hashim Kasim, Abdul Rahman Amir Razif Arief, Jamil Abdullah uda@unimap.edu.my Amplifiers Field effect transistor switches Photolithography Nonelectric sensing devices Integrated circuit fabrication Light sensor MOSFET Link to publisher's homepage at http://ieeexplore.ieee.org The usage of MOSFET is not limited as amplifier and switch only but it has great potential to become the sensors when sensing mediums which integrated on to MOSFET. This research is intended to study the combination of MOSFET and photoconductive material to perform as a single device Light Sensor MOSFET (LiSFET) using standard lithography process. Photolithography (also called optical lithography) has long been used to transfer circuit patterns from a template called photomask (or simply mask) on to silicon wafers during integrated circuit (IC) fabrication. When a light source is used to project the mask image onto the wafer, the image quality is often affected by the performance of the imaging system (also called exposure system). 2009-12-06T01:15:09Z 2009-12-06T01:15:09Z 2008-12-01 Article p.1-5 978-1-4244-2315-6 http://ieeexplore.ieee.org/search/wrapper.jsp?arnumber=4786651 http://dspace.unimap.edu.my/123456789/7366 en Proceedings of the International Conference on Electronic Design (ICED 2008) Institute of Electrical and Electronics Engineering (IEEE) |
| spellingShingle | Amplifiers Field effect transistor switches Photolithography Nonelectric sensing devices Integrated circuit fabrication Light sensor MOSFET Uda, Hashim Kasim, Abdul Rahman Amir Razif Arief, Jamil Abdullah Mask design and fabrication of LiSFET for light sensor application |
| title | Mask design and fabrication of LiSFET for light sensor application |
| title_full | Mask design and fabrication of LiSFET for light sensor application |
| title_fullStr | Mask design and fabrication of LiSFET for light sensor application |
| title_full_unstemmed | Mask design and fabrication of LiSFET for light sensor application |
| title_short | Mask design and fabrication of LiSFET for light sensor application |
| title_sort | mask design and fabrication of lisfet for light sensor application |
| topic | Amplifiers Field effect transistor switches Photolithography Nonelectric sensing devices Integrated circuit fabrication Light sensor MOSFET |
| url | http://dspace.unimap.edu.my/123456789/7366 |
| url_provider | http://dspace.unimap.edu.my/ |