Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

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Bibliographic Details

Main Authors:	Mohammad Nuzaihan, Md Nor, Uda, Hashim, Nur Hamidah, Abdul Halim, Bajuri, S. N M
Format:	Article
Language:	en
Published:	Nano Science and Technology Institute 2009
Subjects:	Electron beam lithography ma-N 2405 resist Nanowires PMMA Scanning electron microscope Nanotechnology Nanowires > Design and construction Nanostructured materials
Online Access:	http://dspace.unimap.edu.my/123456789/6977
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