APA (7th ed.) Citation

Mohammad Nuzaihan, M. N., Uda, H., Nur Hamidah, A. H., & Bajuri, S. N. M. (2009). Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist. Nano Science and Technology Institute.

Chicago Style (17th ed.) Citation

Mohammad Nuzaihan, Md Nor, Hashim Uda, Abdul Halim Nur Hamidah, and S. N M. Bajuri. Nanowire Formation for Single Electron Transistor Using SEM Based Electron Beam Lithography (EBL) Technique: Positive Tone Vs Negative Tone E-beam Resist. Nano Science and Technology Institute, 2009.

MLA (9th ed.) Citation

Mohammad Nuzaihan, Md Nor, et al. Nanowire Formation for Single Electron Transistor Using SEM Based Electron Beam Lithography (EBL) Technique: Positive Tone Vs Negative Tone E-beam Resist. Nano Science and Technology Institute, 2009.