Normah, A., Uda, H., Mohd Jeffery, M., & Kader Ibrahim, A. W. (2009). Effect of alignment mark architecture on alignment signal behavior in advanced lithography. Universiti Malaya.
Chicago Style (17th ed.) CitationNormah, Ahmad, Hashim Uda, Manaf Mohd Jeffery, and Abdul Wahab Kader Ibrahim. Effect of Alignment Mark Architecture on Alignment Signal Behavior in Advanced Lithography. Universiti Malaya, 2009.
MLA (9th ed.) CitationNormah, Ahmad, et al. Effect of Alignment Mark Architecture on Alignment Signal Behavior in Advanced Lithography. Universiti Malaya, 2009.
Warning: These citations may not always be 100% accurate.
