APA (7th ed.) Citation

Normah, A., Uda, H., Mohd Jeffrey, M., & Kader Ibrahim, A. W. (2009). Alignment mark architecture effect on alignment signal behavior in advanced lithography. Institute of Electrical and Electronics Engineering (IEEE).

Chicago Style (17th ed.) Citation

Normah, Ahmad, Hashim Uda, Manaf Mohd Jeffrey, and Abdul Wahab Kader Ibrahim. Alignment Mark Architecture Effect on Alignment Signal Behavior in Advanced Lithography. Institute of Electrical and Electronics Engineering (IEEE), 2009.

MLA (9th ed.) Citation

Normah, Ahmad, et al. Alignment Mark Architecture Effect on Alignment Signal Behavior in Advanced Lithography. Institute of Electrical and Electronics Engineering (IEEE), 2009.