Tijjani Adam, S., Uda, H., Leow, P. L., & tijjaniadam@yahoo.com. (2013). Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire. Institute of Electrical and Electronics Engineers (IEEE).
Chicago Style (17th ed.) CitationTijjani Adam, Shuwa, Hashim Uda, Pei Ling Leow, and tijjaniadam@yahoo.com. Mask Design for the Reproducible Fabrication and Reliable Pattern Transfer for Polysilicon Nanowire. Institute of Electrical and Electronics Engineers (IEEE), 2013.
MLA (9th ed.) CitationTijjani Adam, Shuwa, et al. Mask Design for the Reproducible Fabrication and Reliable Pattern Transfer for Polysilicon Nanowire. Institute of Electrical and Electronics Engineers (IEEE), 2013.
Warning: These citations may not always be 100% accurate.