Ali, M. F., & (Advisor), R. A. R. (2008). Study of the thickness of the Silicon Dioxide on wafer using Dry and Wet Oxidation method. Universiti Malaysia Perlis.
Chicago Style (17th ed.) CitationAli, Mohamad Fadzli, and Ruslinda A. Rahim (Advisor). Study of the Thickness of the Silicon Dioxide on Wafer Using Dry and Wet Oxidation Method. Universiti Malaysia Perlis, 2008.
MLA (9th ed.) CitationAli, Mohamad Fadzli, and Ruslinda A. Rahim (Advisor). Study of the Thickness of the Silicon Dioxide on Wafer Using Dry and Wet Oxidation Method. Universiti Malaysia Perlis, 2008.
Warning: These citations may not always be 100% accurate.