Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile
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| Format: | Learning Object |
| Language: | en |
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Universiti Malaysia Perlis
2008
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| Online Access: | http://dspace.unimap.edu.my/123456789/1993 |
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| _version_ | 1831781323766759424 |
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| author | Zaharah Mohamed |
| author2 | Nur Juliana Juhari (Advisor) |
| author_facet | Nur Juliana Juhari (Advisor) Zaharah Mohamed |
| author_sort | Zaharah Mohamed |
| building | UniMAP Library |
| collection | Institutional Repository |
| content_provider | Universiti Malaysia Perlis |
| content_source | UniMAP Library Digital Repository |
| continent | Asia |
| country | Malaysia |
| description | Access is limited to UniMAP community. |
| format | Learning Object |
| id | my.unimap-1993 |
| institution | Universiti Malaysia Perlis |
| language | en |
| publishDate | 2008 |
| publisher | Universiti Malaysia Perlis |
| record_format | dspace |
| spelling | my.unimap-19932008-09-08T13:01:17Z Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile Zaharah Mohamed Nur Juliana Juhari (Advisor) Semiconductors -- Etching Plasma etching Silicon oxide Semiconductors -- Design and construction Integrated circuits Access is limited to UniMAP community. The principal focus of this project is dry etching technique by using the Inductively Couple Plasma-Reactive Ion Etching (ICP-RIE). An (ICP) system was chosen because of its high plasma density and low cost relative to other high density plasma etching systems. The etch rates and picture size were studied as a function of ICP power, pressure, RF power bias, process time and gas composition. Dry etching technique is favoured in most etching work due to it’s etch rate properties. This project to provide a recipe for get the effect of different gases parameter in dry etching process on etch rate profile. For obtain the profile etch rate and picture size by using a profilometer and Scanning Electron Microscope (SEM) imaging. 2008-09-08T13:01:17Z 2008-09-08T13:01:17Z 2008-04 Learning Object http://dspace.unimap.edu.my/123456789/1993 en Universiti Malaysia Perlis School of Microelectronic Engineering |
| spellingShingle | Semiconductors -- Etching Plasma etching Silicon oxide Semiconductors -- Design and construction Integrated circuits Zaharah Mohamed Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title | Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title_full | Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title_fullStr | Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title_full_unstemmed | Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title_short | Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile |
| title_sort | study of the effect of different gases parameter in dry etching process on etch rate profile |
| topic | Semiconductors -- Etching Plasma etching Silicon oxide Semiconductors -- Design and construction Integrated circuits |
| url | http://dspace.unimap.edu.my/123456789/1993 |
| url_provider | http://dspace.unimap.edu.my/ |