Bunseng, C., Soh, C., Kang, E. S., Hui, S. K., Lim, W. J., Saad, I., & Bolong, N. (2021). High-k gate dielectric nano-FET leakage current analysis. Institute of Electrical and Electronics Engineers.
Chicago Style (17th ed.) CitationBunseng, Chan, Charlie Soh, Eng Siew Kang, Seng Kheong Hui, Wei Jer Lim, Ismail Saad, and Nurmin Bolong. High-k Gate Dielectric Nano-FET Leakage Current Analysis. Institute of Electrical and Electronics Engineers, 2021.
MLA (9th ed.) CitationBunseng, Chan, et al. High-k Gate Dielectric Nano-FET Leakage Current Analysis. Institute of Electrical and Electronics Engineers, 2021.
Warning: These citations may not always be 100% accurate.
