Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight
Graphitic carbon nitride (g-C3N4) is one of the most promising semiconductor materials applied in photocatalytic applications. However, the photocatalytic performance of bulk g-C3N4 was not satisfactory due to poor visible-light absorption, quick recombination, and low amount of active interfacial r...
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Elsevier B.V.
2024
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| Online Access: | http://umpir.ump.edu.my/id/eprint/42949/1/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride_ABST.pdf http://umpir.ump.edu.my/id/eprint/42949/2/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride.pdf http://umpir.ump.edu.my/id/eprint/42949/ https://doi.org/10.1016/j.flatc.2024.100762 |
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| author | Solayman, H. M. Noor Yahida, Yahya Leong, Kah Hon Hossain, Md. Kamal Kang, Kang Sim, Lan Ching Zoh, Kyung-Duk Khan, Md. Badiuzzaman Azrina, Abd Aziz |
| author_facet | Solayman, H. M. Noor Yahida, Yahya Leong, Kah Hon Hossain, Md. Kamal Kang, Kang Sim, Lan Ching Zoh, Kyung-Duk Khan, Md. Badiuzzaman Azrina, Abd Aziz |
| author_sort | Solayman, H. M. |
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| content_provider | Universiti Malaysia Pahang Al-Sultan Abdullah |
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| continent | Asia |
| country | Malaysia |
| description | Graphitic carbon nitride (g-C3N4) is one of the most promising semiconductor materials applied in photocatalytic applications. However, the photocatalytic performance of bulk g-C3N4 was not satisfactory due to poor visible-light absorption, quick recombination, and low amount of active interfacial reaction sites. In this study, we have modified the bulk g-C3N4 by acid (nitric, hydrochloric and sulphuric) exfoliation to enhance the photocatalytic degradation of methylene blue (MB) and methyl orange (MO) dye. Sulfuric acid-treated g-C3N4 photocatalyst (CN-S) presented significant photocatalytic degradation toward both MO and MB compared to the pristine g-C3N4. The photocatalytic degradation performance for CN-S is found to be ∼ 96.89 % for MO and ∼ 93.12 % for MB under 150 min under direct sunlight irradiation. Free radical scavenging tests showed the superoxide radicals (•O2−) were mostly responsible to the photodegradation of dyes while comparing to hydroxyl radicals (•OH) and photo-induced holes (h+). Which is attributed by Photoluminescence (PL) and time resolved PL emission spectra indicated a low electron-hole pair’s (e−/h+) recombination and longer charge-carrier lifetime. Moreover, the CN-S showed excellent recyclability for up to 5 runs with a slight reduction of degradation performance from 96.89 to 90.55 % for MO and 93.12 % to 88.84 % for MB dye, respectively. Ultimately, the results demonstrated that CN-S was a superb photocatalyst for the elimination and deterioration of MB and MO dyes from wastewater. |
| format | Article |
| id | my.ump.umpir.42949 |
| institution | Universiti Malaysia Pahang |
| language | en en |
| publishDate | 2024 |
| publisher | Elsevier B.V. |
| record_format | eprints |
| spelling | my.ump.umpir.429492024-11-20T04:25:41Z http://umpir.ump.edu.my/id/eprint/42949/ Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight Solayman, H. M. Noor Yahida, Yahya Leong, Kah Hon Hossain, Md. Kamal Kang, Kang Sim, Lan Ching Zoh, Kyung-Duk Khan, Md. Badiuzzaman Azrina, Abd Aziz TA Engineering (General). Civil engineering (General) Graphitic carbon nitride (g-C3N4) is one of the most promising semiconductor materials applied in photocatalytic applications. However, the photocatalytic performance of bulk g-C3N4 was not satisfactory due to poor visible-light absorption, quick recombination, and low amount of active interfacial reaction sites. In this study, we have modified the bulk g-C3N4 by acid (nitric, hydrochloric and sulphuric) exfoliation to enhance the photocatalytic degradation of methylene blue (MB) and methyl orange (MO) dye. Sulfuric acid-treated g-C3N4 photocatalyst (CN-S) presented significant photocatalytic degradation toward both MO and MB compared to the pristine g-C3N4. The photocatalytic degradation performance for CN-S is found to be ∼ 96.89 % for MO and ∼ 93.12 % for MB under 150 min under direct sunlight irradiation. Free radical scavenging tests showed the superoxide radicals (•O2−) were mostly responsible to the photodegradation of dyes while comparing to hydroxyl radicals (•OH) and photo-induced holes (h+). Which is attributed by Photoluminescence (PL) and time resolved PL emission spectra indicated a low electron-hole pair’s (e−/h+) recombination and longer charge-carrier lifetime. Moreover, the CN-S showed excellent recyclability for up to 5 runs with a slight reduction of degradation performance from 96.89 to 90.55 % for MO and 93.12 % to 88.84 % for MB dye, respectively. Ultimately, the results demonstrated that CN-S was a superb photocatalyst for the elimination and deterioration of MB and MO dyes from wastewater. Elsevier B.V. 2024-11 Article PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/42949/1/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride_ABST.pdf pdf en http://umpir.ump.edu.my/id/eprint/42949/2/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride.pdf Solayman, H. M. and Noor Yahida, Yahya and Leong, Kah Hon and Hossain, Md. Kamal and Kang, Kang and Sim, Lan Ching and Zoh, Kyung-Duk and Khan, Md. Badiuzzaman and Azrina, Abd Aziz (2024) Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight. FlatChem, 48 (100762). pp. 1-12. ISSN 2452-2627. (Published) https://doi.org/10.1016/j.flatc.2024.100762 https://doi.org/10.1016/j.flatc.2024.100762 |
| spellingShingle | TA Engineering (General). Civil engineering (General) Solayman, H. M. Noor Yahida, Yahya Leong, Kah Hon Hossain, Md. Kamal Kang, Kang Sim, Lan Ching Zoh, Kyung-Duk Khan, Md. Badiuzzaman Azrina, Abd Aziz Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title | Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title_full | Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title_fullStr | Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title_full_unstemmed | Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title_short | Photocatalytic performance of acid exfoliated graphitic carbon nitride (g-C3N4) for the degradation of dye under direct sunlight |
| title_sort | photocatalytic performance of acid exfoliated graphitic carbon nitride (g-c3n4) for the degradation of dye under direct sunlight |
| topic | TA Engineering (General). Civil engineering (General) |
| url | http://umpir.ump.edu.my/id/eprint/42949/1/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride_ABST.pdf http://umpir.ump.edu.my/id/eprint/42949/2/Photocatalytic%20performance%20of%20acid%20exfoliated%20graphitic%20carbon%20nitride.pdf http://umpir.ump.edu.my/id/eprint/42949/ https://doi.org/10.1016/j.flatc.2024.100762 https://doi.org/10.1016/j.flatc.2024.100762 |
| url_provider | http://umpir.ump.edu.my/ |