Chan, K., Aspanut, Z., & Rahman, S. (2013). Effect of rapid thermal annealing time on Au/SiOx film prepared by hot wire assisted plasma enhanced chemical vapour deposition technique. Elsevier.
Chicago Style (17th ed.) CitationChan, K.W, Zarina Aspanut, and S.A Rahman. Effect of Rapid Thermal Annealing Time on Au/SiOx Film Prepared by Hot Wire Assisted Plasma Enhanced Chemical Vapour Deposition Technique. Elsevier, 2013.
MLA (9th ed.) CitationChan, K.W, et al. Effect of Rapid Thermal Annealing Time on Au/SiOx Film Prepared by Hot Wire Assisted Plasma Enhanced Chemical Vapour Deposition Technique. Elsevier, 2013.
Warning: These citations may not always be 100% accurate.