APA (7th ed.) Citation

Awang, R., & Rahman, S. (2009). Properties of a-C: H films deposited in CH4 H2 and CH4he DC plasma.

Chicago Style (17th ed.) Citation

Awang, R., and S.A Rahman. Properties of A-C: H Films Deposited in CH4 H2 and CH4he DC Plasma. 2009.

MLA (9th ed.) Citation

Awang, R., and S.A Rahman. Properties of A-C: H Films Deposited in CH4 H2 and CH4he DC Plasma. 2009.

Warning: These citations may not always be 100% accurate.