Chong, S., Goh, B., Aspanut, Z., Muhamad, M., Dee, C., & Rahman, S. (2011). Effect of rf power on the growth of silicon nanowires by hot-wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique.
Chicago Style (17th ed.) CitationChong, S.K, B.T Goh, Z. Aspanut, M.R Muhamad, C.F Dee, and S.A Rahman. Effect of Rf Power on the Growth of Silicon Nanowires by Hot-wire Assisted Plasma Enhanced Chemical Vapor Deposition (HW-PECVD) Technique. 2011.
MLA (9th ed.) CitationChong, S.K, et al. Effect of Rf Power on the Growth of Silicon Nanowires by Hot-wire Assisted Plasma Enhanced Chemical Vapor Deposition (HW-PECVD) Technique. 2011.
Warning: These citations may not always be 100% accurate.