Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films
Hydrogenated amorphous carbon (a-C:H) and hydrogenated amorphous carbon nitride (a-CN(x):H) films were prepared in a custom-built radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system with a parallel-plate configuration. Pure methane and a gas mixture of methane and nitrogen we...
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IOP Publishing
2009
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| Online Access: | http://eprints.um.edu.my/7332/ https://doi.org/10.1143/JJAP.48.101301 |
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| author | Ritikos, Richard Chow, Chee Siong Gani, Siti Meriam Ab Muhamad, Muhamad Rasat Rahman, Saadah Abdul |
| author_facet | Ritikos, Richard Chow, Chee Siong Gani, Siti Meriam Ab Muhamad, Muhamad Rasat Rahman, Saadah Abdul |
| author_sort | Ritikos, Richard |
| building | UM Library |
| collection | Institutional Repository |
| content_provider | Universiti Malaya |
| content_source | UM Research Repository |
| continent | Asia |
| country | Malaysia |
| description | Hydrogenated amorphous carbon (a-C:H) and hydrogenated amorphous carbon nitride (a-CN(x):H) films were prepared in a custom-built radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system with a parallel-plate configuration. Pure methane and a gas mixture of methane and nitrogen were used as gas sources to obtain these films. The films were characterized using Fourier transform infrared and optical transmission spectroscopy techniques. The incorporation of nitrogen and the effect of annealing (100-500 degrees C) on the film properties were studied. The films were determined to be thermally stable up to 300 degrees C. Upon annealing above 300 degrees C, the thickness and refractive index of both a-C:H and a-CN(x):H films increase while the optical energy gap E(04) decreases. These effects were more pronounced in a-CN(x):H. From the IR spectra, these changes are considered to be due to the decreases in nitrogen and hydrogen concentrations in the films which result in their structural modification. |
| format | Article |
| id | my.um.eprints-7332 |
| institution | Universiti Malaya |
| publishDate | 2009 |
| publisher | IOP Publishing |
| record_format | eprints |
| spelling | my.um.eprints-73322018-10-23T01:24:16Z http://eprints.um.edu.my/7332/ Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films Ritikos, Richard Chow, Chee Siong Gani, Siti Meriam Ab Muhamad, Muhamad Rasat Rahman, Saadah Abdul Q Science (General) QC Physics Hydrogenated amorphous carbon (a-C:H) and hydrogenated amorphous carbon nitride (a-CN(x):H) films were prepared in a custom-built radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system with a parallel-plate configuration. Pure methane and a gas mixture of methane and nitrogen were used as gas sources to obtain these films. The films were characterized using Fourier transform infrared and optical transmission spectroscopy techniques. The incorporation of nitrogen and the effect of annealing (100-500 degrees C) on the film properties were studied. The films were determined to be thermally stable up to 300 degrees C. Upon annealing above 300 degrees C, the thickness and refractive index of both a-C:H and a-CN(x):H films increase while the optical energy gap E(04) decreases. These effects were more pronounced in a-CN(x):H. From the IR spectra, these changes are considered to be due to the decreases in nitrogen and hydrogen concentrations in the films which result in their structural modification. IOP Publishing 2009 Article PeerReviewed Ritikos, Richard and Chow, Chee Siong and Gani, Siti Meriam Ab and Muhamad, Muhamad Rasat and Rahman, Saadah Abdul (2009) Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films. Japanese Journal of Applied Physics, 48 (10). 101301-1-101301-4. ISSN 0021-4922, DOI https://doi.org/10.1143/jjap.48.101301 <https://doi.org/10.1143/jjap.48.101301>. https://doi.org/10.1143/JJAP.48.101301 doi:10.1143/jjap.48.101301 |
| spellingShingle | Q Science (General) QC Physics Ritikos, Richard Chow, Chee Siong Gani, Siti Meriam Ab Muhamad, Muhamad Rasat Rahman, Saadah Abdul Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title | Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title_full | Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title_fullStr | Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title_full_unstemmed | Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title_short | Effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| title_sort | effect of annealing on the optical and chemical bonding properties of hydrogenated amorphous carbon and hydrogenated amorphous carbon nitride thin films |
| topic | Q Science (General) QC Physics |
| url | http://eprints.um.edu.my/7332/ https://doi.org/10.1143/JJAP.48.101301 |
| url_provider | http://eprints.um.edu.my/ |