APA (7th ed.) Citation

Rashid, N., Ritikos, R., Othman, M., Khanis, N., Gani, S., Muhamad, M., & Rahman, S. (2013). Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power.

Chicago Style (17th ed.) Citation

Rashid, N.M.A, R. Ritikos, M. Othman, N.H Khanis, S.M.A Gani, M.R Muhamad, and S.A Rahman. Amorphous Silicon Carbon Films Prepared by Hybrid Plasma Enhanced Chemical Vapor/sputtering Deposition System: Effects of R.f. Power. 2013.

MLA (9th ed.) Citation

Rashid, N.M.A, et al. Amorphous Silicon Carbon Films Prepared by Hybrid Plasma Enhanced Chemical Vapor/sputtering Deposition System: Effects of R.f. Power. 2013.