Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films

TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The struc...

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Bibliographic Details

Main Authors:	Hasan, M.M., Haseeb, A.S. Md. Abdul, Saidur, Rahman, Masjuki, Haji Hassan, Abd Shukor, Mohd Hamdi
Format:	Article
Published:	Elsevier 2010
Subjects:	TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery
Online Access:	http://eprints.um.edu.my/6766/ https://doi.org/10.1016/j.optmat.2009.07.011
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