Rahman, M. N. A., Sulaiman, A. F., Abdul Khudus, M. I. M., Allif, K., Talik, N. A., Basri, S. H., & Shuhaimi, A. (2019). Effects of pulse cycle number on the quality of pulsed atomic-layer epitaxy AlN films grown via metal organic chemical vapor deposition. IOP Publishing.
Chicago Style (17th ed.) CitationRahman, Mohd Nazri Abd, Abdullah Fadil Sulaiman, Muhammad Imran Mustafa Abdul Khudus, Kamarul Allif, Noor Azrina Talik, Siti Hajar Basri, and Ahmad Shuhaimi. Effects of Pulse Cycle Number on the Quality of Pulsed Atomic-layer Epitaxy AlN Films Grown via Metal Organic Chemical Vapor Deposition. IOP Publishing, 2019.
MLA (9th ed.) CitationRahman, Mohd Nazri Abd, et al. Effects of Pulse Cycle Number on the Quality of Pulsed Atomic-layer Epitaxy AlN Films Grown via Metal Organic Chemical Vapor Deposition. IOP Publishing, 2019.
