Asa Deepthi, K., Balachandran, R., Ong, B., Tan, K., Wong, H., Yow, H., & Srimala, S. (2016). Physical and electrical characteristics of NiFe thin films using ultrasonic assisted pulse electrodeposition. Elsevier.
Chicago Style (17th ed.) CitationAsa Deepthi, K., R. Balachandran, B.H Ong, K.B Tan, H.Y Wong, H.K Yow, and S. Srimala. Physical and Electrical Characteristics of NiFe Thin Films Using Ultrasonic Assisted Pulse Electrodeposition. Elsevier, 2016.
MLA (9th ed.) CitationAsa Deepthi, K., et al. Physical and Electrical Characteristics of NiFe Thin Films Using Ultrasonic Assisted Pulse Electrodeposition. Elsevier, 2016.
Warning: These citations may not always be 100% accurate.
