Physical and dispersive optical characteristics of ZrON/Si thin-film system
To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physic...
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| Main Authors: | , , , |
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| Format: | Article |
| Published: |
Springer
2014
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/13018/ https://doi.org/10.1007/s00339-013-7947-1 |
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| Summary: | To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700–900 ∘C. |
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