Wong, Y., & Cheong, K. (2012). Effects of oxidation and nitridation temperatures on electrical properties of sputtered Zr thin film based on Si in N2O ambient. Springer Verlag (Germany).
Chicago Style (17th ed.) CitationWong, Y.H, and K.Y Cheong. Effects of Oxidation and Nitridation Temperatures on Electrical Properties of Sputtered Zr Thin Film Based on Si in N2O Ambient. Springer Verlag (Germany), 2012.
MLA (9th ed.) CitationWong, Y.H, and K.Y Cheong. Effects of Oxidation and Nitridation Temperatures on Electrical Properties of Sputtered Zr Thin Film Based on Si in N2O Ambient. Springer Verlag (Germany), 2012.
Warning: These citations may not always be 100% accurate.