Properties of Ta2O5 thin films prepared by ion-assisted deposition
Tantalum penta-oxide (Ta2O5) thin films were deposited onto highly polished and clean, fused silica glass substrates via ion beam-assisted deposition at room temperature using a high-vacuum coater equipped with an electron beam gun. The effects of ion beam parameters, oxygen flow rate, and depositio...
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| Main Authors: | , , |
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| Format: | Article |
| Published: |
Elsevier
2013
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| Online Access: | http://eprints.um.edu.my/11821/ http://www.sciencedirect.com/science/article/pii/S0025540813005801 http://doi.org/10.1016/j.materresbull.2013.06.068 |
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