Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]

This technical paper investigates the effect of doping techniques, type of dopant species and the plate size on the capacitance density of a silicon based capacitor. The substrate of the silicon wafers are highly doped using either solid source (SS) or spin-on dopant (SOD) method. Experiments are ca...

Full description

Saved in:
Bibliographic Details
Main Authors: Zoolfakar, Ahmad Sabirin, Yaacob, Ahmad Akmalhakim, Zolkapli, Maizatul, Zakaria, Azlan, Abdul Wahab, Mohd Zahrin
Format: Article
Language:en
Published: UiTM Press 2010
Subjects:
Online Access:https://ir.uitm.edu.my/id/eprint/61883/1/61883.pdf
https://ir.uitm.edu.my/id/eprint/61883/
https://jeesr.uitm.edu.my/v1/
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1839753492189675520
author Zoolfakar, Ahmad Sabirin
Yaacob, Ahmad Akmalhakim
Zolkapli, Maizatul
Zakaria, Azlan
Abdul Wahab, Mohd Zahrin
author_facet Zoolfakar, Ahmad Sabirin
Yaacob, Ahmad Akmalhakim
Zolkapli, Maizatul
Zakaria, Azlan
Abdul Wahab, Mohd Zahrin
author_sort Zoolfakar, Ahmad Sabirin
building Tun Abdul Razak Library
collection Institutional Repository
content_provider Universiti Teknologi Mara
content_source UiTM Institutional Repository
continent Asia
country Malaysia
description This technical paper investigates the effect of doping techniques, type of dopant species and the plate size on the capacitance density of a silicon based capacitor. The substrate of the silicon wafers are highly doped using either solid source (SS) or spin-on dopant (SOD) method. Experiments are carried out at three different diffusion temperatures, 900oC, 1000oC and 1050oC. Results show that the diffusion by spin-on dopant gives a higher capacitance density compared to diffusion by solid source while larger plate size leads to a larger capacitance value. In addition, the experiment also shows that n-type wafer heavily doped with phosphorus exhibits a higher capacitance density.
format Article
id my.uitm.ir-61883
institution Universiti Teknologi Mara
language en
publishDate 2010
publisher UiTM Press
record_format eprints
spelling my.uitm.ir-618832025-07-31T03:47:14Z https://ir.uitm.edu.my/id/eprint/61883/ Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.] jeesr Zoolfakar, Ahmad Sabirin Yaacob, Ahmad Akmalhakim Zolkapli, Maizatul Zakaria, Azlan Abdul Wahab, Mohd Zahrin TK Electrical engineering. Electronics. Nuclear engineering This technical paper investigates the effect of doping techniques, type of dopant species and the plate size on the capacitance density of a silicon based capacitor. The substrate of the silicon wafers are highly doped using either solid source (SS) or spin-on dopant (SOD) method. Experiments are carried out at three different diffusion temperatures, 900oC, 1000oC and 1050oC. Results show that the diffusion by spin-on dopant gives a higher capacitance density compared to diffusion by solid source while larger plate size leads to a larger capacitance value. In addition, the experiment also shows that n-type wafer heavily doped with phosphorus exhibits a higher capacitance density. UiTM Press 2010-06 Article PeerReviewed text en https://ir.uitm.edu.my/id/eprint/61883/1/61883.pdf Zoolfakar, Ahmad Sabirin and Yaacob, Ahmad Akmalhakim and Zolkapli, Maizatul and Zakaria, Azlan and Abdul Wahab, Mohd Zahrin (2010) Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]. (2010) Journal of Electrical and Electronic Systems Research (JEESR) <https://ir.uitm.edu.my/view/publication/Journal_of_Electrical_and_Electronic_Systems_Research_=28JEESR=29.html>, 3 (1): 10. pp. 82-88. ISSN 1985-5389 https://jeesr.uitm.edu.my/v1/
spellingShingle TK Electrical engineering. Electronics. Nuclear engineering
Zoolfakar, Ahmad Sabirin
Yaacob, Ahmad Akmalhakim
Zolkapli, Maizatul
Zakaria, Azlan
Abdul Wahab, Mohd Zahrin
Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title_full Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title_fullStr Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title_full_unstemmed Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title_short Investigation of doping techniques on the silicon based capacitor / Ahmad Sabirin Zoolfakar ...[et al.]
title_sort investigation of doping techniques on the silicon based capacitor / ahmad sabirin zoolfakar ...[et al.]
topic TK Electrical engineering. Electronics. Nuclear engineering
url https://ir.uitm.edu.my/id/eprint/61883/1/61883.pdf
https://ir.uitm.edu.my/id/eprint/61883/
https://jeesr.uitm.edu.my/v1/
url_provider http://ir.uitm.edu.my/