Fabrication and memristive behavior characterization of titania thin films deposited by reactive sputtering

This paper presents the memristive behavior of sputtered titanium dioxide (TiO₂) thin films on ITO substrate. TiO₂ thin films were deposited on ITO substrate reactive sputtering method while varying the oxygen flow rate (O₂/ (O₂ + Ar) x100) from 10, 20 to 30%. TiO₂ film with 40 nm thickness was depo...

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Bibliographic Details

Main Author:	Shamsul, Muhamad Uzair
Format:	Student Project
Language:	en
Published:	2013
Subjects:	Apparatus and materials Applications of electronics
Online Access:	https://ir.uitm.edu.my/id/eprint/122745/2/122745.pdf https://ir.uitm.edu.my/id/eprint/122745/
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