Fabrication and memristive behavior characterization of titania thin films deposited by reactive sputtering
This paper presents the memristive behavior of sputtered titanium dioxide (TiO₂) thin films on ITO substrate. TiO₂ thin films were deposited on ITO substrate reactive sputtering method while varying the oxygen flow rate (O₂/ (O₂ + Ar) x100) from 10, 20 to 30%. TiO₂ film with 40 nm thickness was depo...
Saved in:
| Main Author: | |
|---|---|
| Format: | Student Project |
| Language: | en |
| Published: |
2013
|
| Subjects: | |
| Online Access: | https://ir.uitm.edu.my/id/eprint/122745/2/122745.pdf https://ir.uitm.edu.my/id/eprint/122745/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|